Thermodynamics of a magnetically expanding plasma with isothermally behaving confined electrons JY Kim, KS Chung, S Kim, JH Ryu, KJ Chung, YS Hwang New Journal of Physics 20 (6), 063033, 2018 | 47 | 2018 |
Magnetic confinement and instability in partially magnetized plasma JY Kim, JY Jang, J Choi, J Wang, WI Jeong, MAI Elgarhy, G Go, KJ Chung, ... Plasma Sources Science and Technology 30 (2), 025011, 2021 | 36 | 2021 |
Experimental verification of the Boltzmann relation in confined plasmas: comparison of noble and molecule gases HC Lee, HJ Hwang, YC Kim, JY Kim, DH Kim, CW Chung Physics of Plasmas 20 (3), 2013 | 29 | 2013 |
Review of the gas breakdown physics and nanomaterial-based ionization gas sensors and their applications JY Kim, I Kaganovich, HC Lee Plasma Sources Science and Technology 31 (3), 033001, 2022 | 23 | 2022 |
Time-dependent kinetic analysis of trapped electrons in a magnetically expanding plasma JY Kim, JY Jang, KS Chung, KJ Chung, YS Hwang Plasma Sources Science and Technology 28 (7), 07LT01, 2019 | 22 | 2019 |
Investigation of the Boltzmann relation in plasmas with non-Maxwellian electron distribution JY Kim, HC Lee, DH Kim, YS Kim, YC Kim, CW Chung Physics of Plasmas 21 (2), 2014 | 17 | 2014 |
Characterization of electron kinetics regime with electron energy probability functions in inductively coupled hydrogen plasmas JY Kim, WH Cho, JJ Dang, KJ Chung, YS Hwang Physics of Plasmas 23 (2), 2016 | 13 | 2016 |
Effect of the electron energy distribution on total energy loss with argon in inductively coupled plasmas JY Kim, YC Kim, YS Kim, CW Chung Physics of Plasmas 22 (1), 2015 | 13 | 2015 |
Kinetic electron cooling in magnetic nozzles: experiments and modeling JY Kim, KJ Chung, K Takahashi, M Merino, E Ahedo Plasma Sources Science and Technology 32 (7), 073001, 2023 | 12 | 2023 |
Dependence of the polytropic index of plasma on magnetic field JY Kim, G Go, YS Hwang, KJ Chung New Journal of Physics 23 (5), 052001, 2021 | 12 | 2021 |
Kinetics of electrons and neutral particles in radio-frequency transformer coupled plasma H− ion source at Seoul National University KJ Chung, JJ Dang, JY Kim, WH Cho, YS Hwang New Journal of Physics 18 (10), 105006, 2016 | 11 | 2016 |
Power dependence of electron density at various pressures in inductively coupled plasmas JY Kim, DH Kim, JH Kim, SB Jeon, SW Cho, CW Chung Physics of Plasmas 21 (11), 2014 | 11 | 2014 |
Effect of boronization in VEST: Achieving 0.1 MA discharge J Yang, SH Hong, D Kim, J Jang, JY Kim, EC Jung, Y Kim, YS Hwang Fusion Engineering and Design 137, 358-361, 2018 | 9 | 2018 |
Optimization of plasma parameters with magnetic filter field and pressure to maximize H− ion density in a negative hydrogen ion source WH Cho, JJ Dang, JY Kim, KJ Chung, YS Hwang Review of Scientific Instruments 87 (2), 2016 | 8 | 2016 |
Enhancement of negative hydrogen ion production at low pressure by controlling the electron kinetics property with transverse magnetic field JY Kim, WH Cho, JJ Dang, S Kim, KJ Chung, YS Hwang Plasma Sources Science and Technology 25 (6), 065019, 2016 | 7 | 2016 |
Efficiency Improvement of an E×B Penning Discharge Source by Enhanced Cross-field Transport of Electrons JY Kim, J Choi, J Choi, YS Hwang, KJ Chung Plasma Sources Science and Technology, 2022 | 6 | 2022 |
Electric potential in partially magnetized E× B discharges JY Kim, J Choi, YS Hwang, KJ Chung AIP Advances 11 (8), 2021 | 6 | 2021 |
High-magnetic-confinement mode in partially magnetized plasmas JY Kim, J Choi, YS Hwang, KJ Chung Physical Review E 105 (5), L053202, 2022 | 5 | 2022 |
Experimental evidence of various mode numbers of azimuthal waves in an Penning source for semiconductor processing C Cheon, J Choi, JBW Koo, JY Kim Plasma Sources Science and Technology 32 (7), 07LT01, 2023 | 3 | 2023 |
Rotating spoke frequency in E× B penning source with two-ion-species plasma J Choi, C Cheon, YS Hwang, KJ Chung, JY Kim Plasma Sources Science and Technology 32 (1), 01LT01, 2023 | 3 | 2023 |