| Talbot lithography: self-imaging of complex structures A Isoyan, F Jiang, YC Cheng, F Cerrina, P Wachulak, L Urbanski, J Rocca, ... Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2009 | 132 | 2009 |
| Defect-tolerant extreme ultraviolet nanoscale printing L Urbanski, A Isoyan, A Stein, JJ Rocca, CS Menoni, MC Marconi Optics letters 37 (17), 3633-3635, 2012 | 50 | 2012 |
| Extreme ultraviolet holographic lithography: Initial results YC Cheng, A Isoyan, J Wallace, M Khan, F Cerrina Applied Physics Letters 90 (2), 2007 | 41 | 2007 |
| High-efficiency low-absorption Fresnel compound zone plates for hard x-ray focusing [4783-11] A Kuyumchyan, AA Isoyan, EV Shulakov, VV Aristov, M Kondratenkov, ... PROCEEDINGS-SPIE THE INTERNATIONAL SOCIETY FOR OPTICAL ENGINEERING, 92-96, 2002 | 41* | 2002 |
| Extreme ultraviolet/soft X-ray laser nano-scale patterning using the demagnified talbot effect MC Marconi, L Urbanski, JJ Rocca, A Isoyan US Patent 9,007,562, 2015 | 38 | 2015 |
| 4X reduction extreme ultraviolet interferometric lithography A Isoyan, A Wüest, J Wallace, F Jiang, F Cerrina Optics Express 16 (12), 9106-9111, 2008 | 32 | 2008 |
| A novel EUV exposure station for nanotechnology studies J Wallace, YC Cheng, A Isoyan, Q Leonard, M Fisher, M Green, ... Nuclear Instruments and Methods in Physics Research Section A: Accelerators …, 2007 | 20 | 2007 |
| Progress in extreme ultraviolet interferometric and holographic lithography A Isoyan, YC Cheng, F Jiang, J Wallace, F Cerrina, S Bollepalli Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2007 | 20 | 2007 |
| Defect tolerant extreme ultraviolet lithography technique L Urbanski, W Li, JJ Rocca, CS Menoni, MC Marconi, A Isoyan, A Stein Journal of Vacuum Science & Technology B 30 (6), 2012 | 14 | 2012 |
| Analysis of a scheme for de-magnified Talbot lithography L Urbanski, MC Marconi, A Isoyan, A Stein, CS Menoni, JJ Rocca Journal of Vacuum Science & Technology B 29 (6), 2011 | 14 | 2011 |
| Engineering study of extreme ultraviolet interferometric lithography F Jiang, YC Cheng, A Isoyan, F Cerrina Journal of Micro/Nanolithography, MEMS and MOEMS 8 (2), 021203-021203-13, 2009 | 12 | 2009 |
| Progress in extreme ultraviolet interferometric lithography at the University of Wisconsin A Isoyan, YC Cheng, F Jiang, J Wallace, M Efremov, P Nealey, F Cerrina Proceedings of SPIE 6921, 69212R, 2008 | 11 | 2008 |
| Fast photolithography process simulation to predict remaining resist thickness A Isoyan, LS Melvin III US Patent 8,473,271, 2013 | 7 | 2013 |
| Optical proximity correction using holographic imaging technique A Isoyan, LS Melvin Journal of Vacuum Science & Technology B 32 (6), 2014 | 6 | 2014 |
| Tabletop soft x-ray lithography MC Marconi, PW Wachulak, L Urbanski, A Isoyan, F Jiang, YC Cheng, ... Soft X-Ray Lasers and Applications VIII 7451, 127-128, 2009 | 6 | 2009 |
| Modelling strategies for the incorporation and correction of optical effects in EUVL P Pathak, Q Yan, T Schmoeller, E Croffie, A Isoyan, LS Melvin III Microelectronic engineering 86 (4-6), 500-504, 2009 | 6 | 2009 |
| Extreme ultraviolet holographic lithography with a table-top laser A Isoyan, F Jiang, YC Cheng, P Wachulak, L Urbanski, J Rocca, ... Alternative Lithographic Technologies 7271, 977-982, 2009 | 6 | 2009 |
| Method and apparatus for process window modeling A Isoyan US Patent 8,739,076, 2014 | 5 | 2014 |
| Aspects of nanometer scale imaging with extreme ultraviolet (EUV) laboratory sources PW Wachulak, MC Marconi, A Isoyan, L Urbanski, A Bartnik, ... Opto-Electronics Review 20, 1-14, 2012 | 5 | 2012 |
| Process window modeling using focus balancing technique A Isoyan, E Croffie, LS Melvin Journal of Vacuum Science & Technology B 29 (6), 2011 | 5 | 2011 |
Mario MarconiProfessor of Electrical and Computer Engineering, Colorado State UniversityVerified email at engr.colostate.edu
