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Artak Isoyan
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Talbot lithography: self-imaging of complex structures
A Isoyan, F Jiang, YC Cheng, F Cerrina, P Wachulak, L Urbanski, J Rocca, ...
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer†…, 2009
1322009
Defect-tolerant extreme ultraviolet nanoscale printing
L Urbanski, A Isoyan, A Stein, JJ Rocca, CS Menoni, MC Marconi
Optics letters 37 (17), 3633-3635, 2012
492012
Extreme ultraviolet holographic lithography: Initial results
YC Cheng, A Isoyan, J Wallace, M Khan, F Cerrina
Applied Physics Letters 90 (2), 2007
412007
High-efficiency low-absorption Fresnel compound zone plates for hard x-ray focusing [4783-11]
A Kuyumchyan, AA Isoyan, EV Shulakov, VV Aristov, M Kondratenkov, ...
PROCEEDINGS-SPIE THE INTERNATIONAL SOCIETY FOR OPTICAL ENGINEERING, 92-96, 2002
41*2002
Extreme ultraviolet/soft X-ray laser nano-scale patterning using the demagnified talbot effect
MC Marconi, L Urbanski, JJ Rocca, A Isoyan
US Patent 9,007,562, 2015
382015
4X reduction extreme ultraviolet interferometric lithography
A Isoyan, A WŁest, J Wallace, F Jiang, F Cerrina
Optics Express 16 (12), 9106-9111, 2008
292008
A novel EUV exposure station for nanotechnology studies
J Wallace, YC Cheng, A Isoyan, Q Leonard, M Fisher, M Green, ...
Nuclear Instruments and Methods in Physics Research Section A: Accelerators†…, 2007
202007
Progress in extreme ultraviolet interferometric and holographic lithography
A Isoyan, YC Cheng, F Jiang, J Wallace, F Cerrina, S Bollepalli
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer†…, 2007
202007
Defect tolerant extreme ultraviolet lithography technique
L Urbanski, W Li, JJ Rocca, CS Menoni, MC Marconi, A Isoyan, A Stein
Journal of Vacuum Science & Technology B 30 (6), 2012
142012
Analysis of a scheme for de-magnified Talbot lithography
L Urbanski, MC Marconi, A Isoyan, A Stein, CS Menoni, JJ Rocca
Journal of Vacuum Science & Technology B 29 (6), 2011
142011
Engineering study of extreme ultraviolet interferometric lithography
F Jiang, YC Cheng, A Isoyan, F Cerrina
Journal of Micro/Nanolithography, MEMS and MOEMS 8 (2), 021203-021203-13, 2009
122009
Progress in extreme ultraviolet interferometric lithography at the University of Wisconsin
A Isoyan, YC Cheng, F Jiang, J Wallace, M Efremov, P Nealey, F Cerrina
Proceedings of SPIE 6921, 69212R, 2008
102008
Fast photolithography process simulation to predict remaining resist thickness
A Isoyan, LS Melvin III
US Patent 8,473,271, 2013
72013
Optical proximity correction using holographic imaging technique
A Isoyan, LS Melvin
Journal of Vacuum Science & Technology B 32 (6), 2014
62014
Tabletop soft x-ray lithography
MC Marconi, PW Wachulak, L Urbanski, A Isoyan, F Jiang, YC Cheng, ...
Soft X-Ray Lasers and Applications VIII 7451, 127-128, 2009
62009
Modelling strategies for the incorporation and correction of optical effects in EUVL
P Pathak, Q Yan, T Schmoeller, E Croffie, A Isoyan, LS Melvin III
Microelectronic engineering 86 (4-6), 500-504, 2009
62009
Extreme ultraviolet holographic lithography with a table-top laser
A Isoyan, F Jiang, YC Cheng, P Wachulak, L Urbanski, J Rocca, ...
Alternative Lithographic Technologies 7271, 977-982, 2009
62009
Method and apparatus for process window modeling
A Isoyan
US Patent 8,739,076, 2014
52014
Process window modeling using focus balancing technique
A Isoyan, E Croffie, LS Melvin
Journal of Vacuum Science & Technology B 29 (6), 2011
52011
Predictive modeling for EBPC in EBDW
R Zimmermann, M Schulz, W Hoppe, HJ Stock, W Demmerle, A Zepka, ...
Photomask Technology 2009 7488, 1028-1040, 2009
52009
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