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Pavel Bulkin
Pavel Bulkin
LPICM, UMR 7647 CNRS/Ecole polytechnique
Verified email at polytechnique.edu
Title
Cited by
Cited by
Year
Stable microcrystalline silicon thin-film transistors produced by the layer-by-layer technique
P Roca i Cabarrocas, R Brenot, P Bulkin, R Vanderhaghen, B Drévillon, ...
Journal of Applied Physics 86 (12), 7079-7082, 1999
1051999
Numerical modeling of capacitively coupled hydrogen plasmas: Effects of frequency and pressure
T Novikova, B Kalache, P Bulkin, K Hassouni, W Morscheidt, ...
Journal of Applied Physics 93 (6), 3198-3206, 2003
782003
Plasma treatment of polycarbonate for improved adhesion
A Hofrichter, P Bulkin, B Drévillon
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 20 (1 …, 2002
712002
Metrology of replicated diffractive optics with Mueller polarimetry in conical diffraction
T Novikova, A De Martino, P Bulkin, Q Nguyen, B Drévillon, V Popov, ...
Optics Express 15 (5), 2033-2046, 2007
672007
Properties and applications of electron cyclotron plasma deposited SiOxNy films with graded refractive index profiles
PV Bulkin, PL Swart, BM Lacquet
Journal of non-crystalline solids 187, 484-488, 1995
441995
Electron cyclotron resonance plasma enhanced chemical vapour deposition and optical properties of SiOx thin films
PV Bulkin, PL Swart, BM Lacquet
Journal of non-crystalline solids 226 (1-2), 58-66, 1998
391998
Rugate filter manufacturing by electron cyclotron resonance plasma enhanced chemical vapor deposition of SiNx
PL Swart, PV Bulkin, BM Lacquet
Optical Engineering 36 (4), 1214-1219, 1997
361997
Deposition of SiO2 in integrated distributed electron cyclotron resonance microwave reactor
P Bulkin, N Bertrand, B Drevillon
Thin Solid Films 296 (1-2), 66-68, 1997
361997
Method for forming a film with a graded bandgap by deposition of an amorphous material from a plasma
PRI Cabarrocas, P Bulkin, D Daineka, P Leempoel, P Descamps, ...
US Patent 7,964,438, 2011
352011
High density plasma enhanced chemical vapor deposition of optical thin films
D Daineka, P Bulkin, G Girard, JE Bourée, B Drévillon
The European Physical Journal-Applied Physics 26 (1), 3-9, 2004
322004
Two-dimensional photonic crystals by focused-ion-beam etching of multilayer membranes
K Wang, P Filloux, N Paraire, P Roca i Cabarrocas, P Bulkin
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2003
282003
Real time control of plasma deposited multilayers by multiwavelength ellipsometry
M Kildemo, P Bulkin, S Deniau, B Drévillon
Applied physics letters 68 (24), 3395-3397, 1996
281996
Electron cyclotron resonance plasma deposition of SiNx for optical applications
PV Bulkin, PL Swart, BM Lacquet
Thin Solid Films 241 (1), 247-250, 1994
281994
Large-scale patterning of π-conjugated materials by meniscus guided coating methods
M Richard, A Al-Ajaji, S Ren, A Foti, J Tran, M Frigoli, B Gusarov, ...
Advances in Colloid and Interface Science 275, 102080, 2020
262020
Real-time control by multiwavelength ellipsometry of plasma-deposited multilayers on glass by use of an incoherent-reflection model
M Kildemo, P Bulkin, B Drévillon, O Hunderi
Applied optics 36 (25), 6352-6359, 1997
261997
Fourier-transform design and electron cyclotron resonance plasma-enhanced deposition of lossy graded-index optical coatings
PV Bulkin, PL Swart, BM Lacquet
Applied optics 35 (22), 4413-4419, 1996
261996
Plasma enhanced chemical vapour deposition of SiOxNy in an integrated distributed electron cyclotron resonance reactor
A Hofrichter, P Bulkin, B Drévillon
Applied surface science 142 (1-4), 447-450, 1999
251999
Mirau-based line-field confocal optical coherence tomography
A Dubois, W Xue, O Levecq, P Bulkin, AL Coutrot, J Ogien
Optics Express 28 (6), 7918-7927, 2020
242020
Effect of process parameters on the properties of electron cyclotron resonance plasma deposited silicon-oxynitride
PV Bulkin, PL Swart, BM Lacquet
Journal of non-crystalline solids 187, 403-408, 1995
241995
Advances in the deposition of microcrystalline silicon at high rate by distributed electron cyclotron resonance
PR i Cabarrocas, P Bulkin, D Daineka, TH Dao, P Leempoel, P Descamps, ...
Thin Solid Films 516 (20), 6834-6838, 2008
222008
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