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walter Varhue
walter Varhue
Emeritus Professor of electrical engineering, university of vermont
Verified email at uvm.edu
Title
Cited by
Cited by
Year
Silicon dioxide films deposited by electron cyclotron resonance plasma enhanced chemical vapor deposition
RG Andosca, WJ Varhue, E Adams
Journal of applied physics 72 (3), 1126-1132, 1992
581992
Epitaxial film thickness in the low‐temperature growth of Si (100) by plasma enhanced chemical vapor deposition
WJ Varhue, JL Rogers, PS Andry, E Adams
Applied physics letters 68 (3), 349-351, 1996
421996
Comparison of diamond-like carbon film deposition by electron cyclotron resonance with benzene and methane
PS Andry, PW Pastel, WJ Varhue
Journal of materials research 11 (1), 221-228, 1996
401996
Erbium‐doped silicon films grown by plasma‐enhanced chemical‐vapor deposition
JL Rogers, PS Andry, WJ Varhue, E Adams, M Lavoie, PB Klein
Journal of applied physics 78 (10), 6241-6248, 1995
401995
Growth of Er‐doped silicon using metalorganics by plasma‐enhanced chemical vapor deposition
PS Andry, WJ Varhue, F Ladipo, K Ahmed, E Adams, M Lavoie, PB Klein, ...
Journal of applied physics 80 (1), 551-558, 1996
351996
A MEMS-Based Catalytic Microreactor for a HOMonopropellant Micropropulsion System
SJ Widdis, K Asante, DL Hitt, MW Cross, WJ Varhue, MR McDevitt
IEEE/ASME transactions on mechatronics 18 (4), 1250-1258, 2013
292013
Very-low-frequency electromagnetic field detector with data acquisition
SA Hanna, Y Motai, WJ Varhue, S Titcomb
IEEE Transactions on Instrumentation and Measurement 58 (1), 129-140, 2008
272008
Plasma enhanced CVD process for rapidly growing semiconductor films
WJ Varhue
US Patent 6,313,017, 2001
262001
Deposition of Y2O3 by plasma enhanced organometallic chemical vapor deposition using an electron cyclotron resonance source
WJ Varhue, M Massimo, JM Carrulli, V Baranauskas, E Adams, ...
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 11 (4 …, 1993
261993
Raman scattering and the π‐orbitals in amorphous carbon films
K Sinha, J Menendez, OF Sankey, DA Johnson, WJ Varhue, JN Kidder, ...
Applied physics letters 60 (5), 562-564, 1992
251992
The effect of radio frequency substrate biasing in the deposition of diamond‐like carbon films in an electron cyclotron resonance discharge
PW Pastel, WJ Varhue
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 9 (3 …, 1991
251991
Low‐temperature homoepitaxial growth of Si by electron cyclotron resonance plasma enhanced chemical vapor deposition
JL Rogers, PS Andry, WJ Varhue, P McGaughnea, E Adams, R Kontra
Applied physics letters 67 (7), 971-973, 1995
241995
Diamond-like carbon films prepared by rf substrate biasing in an ECR discharge
W Varhue, P Pastel
Journal of Materials Research 5 (11), 2441-2444, 1990
241990
Structural evolution and characterization of heteroepitaxial GaSb thin films on Si (111) substrates
T Nguyen, W Varhue, M Cross, R Pino, E Adams, M Lavoie, J Lee
Journal of applied physics 101 (7), 2007
232007
Electron cyclotron resonance plasma etching of photoresist at cryogenic temperatures
W Varhue, J Burroughs, W Mlynko
Journal of applied physics 72 (7), 3050-3057, 1992
221992
Control of ruthenium oxide nanorod length in reactive sputtering
MW Cross, WJ Varhue, DL Hitt, E Adams
Nanotechnology 19 (4), 045611, 2008
192008
Lamb-wave microdevices fabricated on monolithic single crystal silicon wafers
D Fischer, WJ Varhue, J Wu, CA Whiting
Journal of Microelectromechanical systems 9 (1), 88-93, 2000
192000
Low temperature growth of Si by PECVD
WJ Varhue, PS Andry, JL Rogers, E Adams, R Kontra, M Lovioe
Solid State Technology 39 (6), 163-168, 1996
181996
Radiative melting of crystalline ruthenium oxide nanorods
MW Cross, WJ Varhue
Nanotechnology 19 (43), 435705, 2008
162008
Comparison of two surface preparations used in the homoepitaxial growth of silicon films by plasma enhanced chemical vapor deposition
S Reidy, WJ Varhue, M Lavoie, S Mongeon, E Adams
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2003
152003
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