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Xiaofei Wu
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Zitiert von
Jahr
Level-set-based inverse lithography for mask synthesis using the conjugate gradient and an optimal time step
W Lv, S Liu, Q Xia, X Wu, Y Shen, EY Lam
Journal of Vacuum Science & Technology B, Nanotechnology and …, 2013
492013
High-order residual network for light field super-resolution
N Meng, X Wu, J Liu, E Lam
Proceedings of the AAAI Conference on Artificial Intelligence 34 (07), 11757 …, 2020
352020
Efficient source mask optimization with Zernike polynomial functions for source representation
X Wu, S Liu, J Li, EY Lam
Optics express 22 (4), 3924-3937, 2014
312014
Learning Causal Representation for Training Cross-Domain Pose Estimator via Generative Interventions
X Zhang, Y Wong, X Wu, J Lu, M Kankanhalli, X Li, W Geng
Proceedings of the IEEE/CVF International Conference on Computer Vision …, 2021
252021
Robust and efficient inverse mask synthesis with basis function representation
X Wu, S Liu, W Lv, EY Lam
JOSA A 31 (12), B1-B9, 2014
162014
Illumination source optimization in optical lithography via derivative-free optimization
W Lv, S Liu, X Wu, EY Lam
JOSA A, 2014
152014
Iterative method for in situ measurement of lens aberrations in lithographic tools using CTC-based quadratic aberration model
S Liu, S Xu, X Wu, W Liu
Optics express 20 (13), 14272-14283, 2012
122012
Comparison of three TCC calculation algorithms for partially coherent imaging simulation
X Wu, S Liu, W Liu, T Zhou, L Wang
Sixth International Symposium on Precision Engineering Measurements and …, 2010
112010
Fast aerial image simulations using one basis mask pattern for optical proximity correction
S Liu, X Wu, W Liu, C Zhang
Journal of Vacuum Science & Technology B, Nanotechnology and …, 2011
72011
Sparse nonlinear inverse imaging for shot count reduction in inverse lithography
X Wu, S Liu, W Lv, EY Lam
Optics Express 23 (21), 26919-26931, 2015
62015
Unifiedgesture: A unified gesture synthesis model for multiple skeletons
S Yang, Z Wang, Z Wu, M Li, Z Zhang, Q Huang, L Hao, S Xu, X Wu, ...
Proceedings of the 31st ACM International Conference on Multimedia, 1033-1044, 2023
52023
Fast evaluation of aberration-induced intensity distribution in partially coherent imaging systems by cross triple correlation
L Shi-Yuan, L Wei, W Xiao-Fei
Chinese Physics Letters 28 (10), 104212, 2011
52011
Incorporating photomask shape uncertainty in computational lithography
X Wu, S Liu, A Erdmann, EY Lam
SPIE Advanced Lithography, 97800Q-97800Q-10, 2016
42016
Impact of photomask shape uncertainties on computational lithography
EY Lam, X Wu
2016 China Semiconductor Technology International Conference (CSTIC), 1-4, 2016
32016
VastGaussian: Vast 3D Gaussians for Large Scene Reconstruction
J Lin, Z Li, X Tang, J Liu, S Liu, J Liu, Y Lu, X Wu, S Xu, Y Yan, W Yang
arXiv preprint arXiv:2402.17427, 2024
22024
基于 Sigmoid 函数的离轴照明光源全参数解析模型
刘巍, 刘世元, 吴小飞, 张传维
物理学报 60 (5), 383-391, 2011
22011
Decorate3D: Text-Driven High-Quality Texture Generation for Mesh Decoration in the Wild
Y Guo, X Zuo, P Dai, J Lu, X Wu, L Cheng, Y Yan, S Xu, X Wu
Thirty-seventh Conference on Neural Information Processing Systems, 2023
12023
Levet-set-based inverse lithography under random field shape uncertainty in a vector Hopkins imaging model
X Wu, T Fühner, A Erdmann, EY Lam
Computational Optical Sensing and Imaging, CW1B. 4, 2017
12017
Computational techniques to incorporate shot count reduction into inverse lithography
X Wu, S Liu, EY Lam
2015 China Semiconductor Technology International Conference, 1-3, 2015
12015
Automated source/mask/directed self-assembly optimization using a self-adaptive hierarchical modeling approach
T Fühner, P Michalak, X Wu, A Erdmann
2016 International Conference on Simulation of Semiconductor Processes and …, 2016
2016
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